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Through a unique partnership with ASML, SNF labmembers
now have access to new optical lithography capabilities. Access is shared
with ASML applications engineers and technicians, who also provide support
for equipment and special engineering needs.
SNF labmembers wishing to schedule training on this
system should contact the appropriate SNF staff first. Please be aware
that training is applications-oriented and consists of building, loading,
and running the user's job file. Therefore, trainees must meet the following
requirements:
- Prerequisites: You must have taken "All-litho"
(introduction to lithography at SNF) and be trained on all the supporting
tools required for photolithography processing (the appropriate coater,
developer, bake oven, etc.)
- Layout File: You must have a GDS file
for your device ready. If you need help with learning how to layout
a device, please contact an SNF staff member. Information on how to
layout an ASML reticle can be found here:
- Emulator Training: Schedule training
on the emulator with ASML. Be prepared to discuss your process flow
so that any engineering needs can be anticipated. Bring your GDS layout
as it will be used to set up your job file. Detailed information about
how to setup a job file can be found in the operation manual for this
system:
- In-lab Training: Once you have set up your
job file and your process flow, schedule training on the system in the
lab. Ideally, you should have wafers ready to begin processing. In-lab
training consists of 1-2 sessions, about 4 hours in length. Emulator
and in-lab training are currently supported by ASML staff and limited
by equipment as well as staff availability. ASML staff are generally
at SNF Wednesdays, Thursdays, and Fridays. An abbreviated form of the
operating procedures for in lab reference is provided here:
Description:
- 5:1 reducing
stepper
- Maximum die width
= 18 mm; Maximum die height = 22.6 mm (actual maximum die is slightly
smaller)
- I-line (365 nm)
- alignment accuracy
of 60 nm.
- Typical resolution
to 0.45 microns
- 5" reticle
masks, 90 to 120 mil thick.
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