Process Information
Hitachi HL-700F Electron Beam Lithography System: ebeam

EBeam Resist Processing
Ebeam Resist Handling Procedures
Single Layer PMMA Ebeam Resist Process
Standard 5% 495K MW PMMA EBeam Resist Process
Bilayer PMMA EBeam Resist for Liftoff Processing
ZEP 520 Ebeam Resist Process

SPIE Handbook of Microlithography, Micromachining and Microfabrication, Chapter 2 on Ebeam Lithography

 

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Stanford Nanofabrication Facility
Last Modified 07/18/2006