Operation
Hitachi EBeam Lithography Machine:
ebeam


How long will my pattern take to expose?

Raw throughput ranges from 1 hr/cm2 for SAL-601 to 15 hrs./cm2 for PMMA. Overhead, especially on complex patterns with lots of shapes, can double these numbers. To estimate your patterning time, multiply the raw throughput by the % area coverage. For example, patterning 25 2X2 mm chips in PMMA with 10% pattern coverage would take 25 * 0.22 * 0.1 = 1.5 - 3 hrs. depending on overhead time.


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Stanford Nanofabrication Facility
Last Modified 07/06/2006