EVG 620 Nanoimprint Lithography System: evg-imprint

Features:

* Wafer sizes up to 100 mm
* Soft-, hard-, vacuum contact and proximity exposure
* Unique wedge compensation system
* UV Light (350-450 nm)
* Special tooling for UV-NIL
* Chuck supports both soft and hard stamps

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Stanford Nanofabrication Facility
Last Modified 06/26/2007