Description: The Headway Coater is used to apply photoresist to any substrate. Centrifugal force uniformly spreads fluid across the surface of the spinning substrate. The spin speed, spin time, and substrate and fluid properties determine the final thickness of the film.

Features:

• Allow manual dispensing of any SNF-acceptable fluid
• Adjustable spin speeds and spin time
• 'Interchangeable vacuum chuck allows processing of wafer chips and substrates of unusual size or shape