Ultra high resolution Ebeam lithography and metrology tool. Suitable for the development of Nanolithographic structures for Microelectronic, MEMS, Photonic, and Integrated optical devices.

• Ultimate resolution specified to 60 nm with sub-30 nm features possible.
• Accurate field stitching (~50 nm) and overlay to better than 30nm typical.
• Ultra high resolution, low voltage SEM inspection with advanced sample navigation and metrology software packages.
• Direct E-beam exposure for chips and wafers to 150 mm diameter.