Qualification procedure for ULTRATECH aligner.

1) Prepare 1 blank Silicon wafers with 1um resist (SPR3612).

- SVG coater program # 7 witn 90C post bake for 1 min.

2) Run Mode3 (Focus/Exposure Matrix)

- X-axis is Exposure, 5 steps -     ( center is 100mj/cm2 with 10% increment)

- Y-axis is  Focus , 7 steps     -     (center is 0 focus  with .5 um increment )

3) Bake 1 min @ 110C and Develop by using SVG developer track(program # 3)

- Find an optimal focus/exposure condition.

o check for 1 um line and space.

          X--à80     90    100    110     120   

          Y

        1.5

        1.0

        0.5

0

      -0.5

      -1.0

      -1.5