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News and Events

Announcements

Heidelberg 2: It's up and available to use! Resolution is 0.5 um with 375 nm light source. Equipped with high-aspect-ratio feature controls. Contact Swaroop about training.

 

Semilab Lehighton system: It's up and available to use! Contactless resistivity mapping measurement system. Contact Xiaoqing about training.

 

Other new equipment: Second Lesker sputter system, Oxford ICP for metal etching, SU-8 processing station, and Hall measurement system are all expected to be available for use in coming months.