Subject: Re: PlasmaTherm DRIE Discussion
From: "Roger T. Howe" <>
Date: Mon, 12 Nov 2012 13:19:53 -0800


It's great that this is moving forward.  Hope everyone can attend.


On 11/12/12 12:46 PM, Ed Myers wrote:
> All,
> I would like to meet at 10am on Wednesday, Nov. 14th in 317 Spilker to 
> discuss the PlasmaTherm DRIE system.  As many of you know the 
> PlasmaTherm DRIE system has completed it's acceptance. This means, it 
> is now available for process characterization.  I would like to meet 
> with the DRIE community to discuss the process needs for the 
> PlasmaTherm system.
> Please come to discuss your process challenges on the STS systems and 
> what needs to happen on the PlasmaTherm system.  If you know anyone 
> who needs DRIE etching, but have not been able to on the STS systems, 
> please make sure they are invited.
> Regards,
> Ed