Greetings:
Users are requested to carefully inspect all patterns exposed on the
system since we came back up on June 24, 2005.
My initial and second qualification exposure runs on the system
using both 2% 950K MW PMMA and ZEP-520 have displayed only the normal
features written and none of the scattering artifacts encountered in
the old column due to blanker leakage and scatter. But I have had
several reports of blurred lines at the beginning of a pattern write.
I may have come across one similar incident writing on ZEP-520.
I am currently reviewing the many patterns and leakage test written and
this week and next will be making measurements on these writes.
Please carefully inspect all patterns written before moving to pattern
transfer by RIE or Metal deposition.
Thank you for your support!
James Conway