Subject: RAITH IonLiNE Ion Beam Lithography system presentation by Lloyd Peto from RAITH GmbH Monday March 19th 2:00 - 3:00 PM Allen 101 conference room
From: "James W. Conway" <>
Date: Tue, 13 Mar 2012 12:26:16 -0700
Tue, 13 Mar 2012 12:26:16 -0700
["multipart/related" not shown]
Greetings Lab Members and SNF Faculty Advisers:

We have a special visitor coming to Stanford, Dr. Lloyd Peto from Raith GmbH, whom is going to be presenting an update on the RAITH IonLiNE Ion Beam Lithography system. He will also be reviewing several projects that are in progress, or have been recently completed, using the RAITH IonLiNE system in Dortmund since his last visit here a year ago.
I would be very pleased if faculty advisers could attend this meeting, to learn more about this capable lithography and nano-engineering system, which offers several unique advantages over the competition.

Dr. Peto and Dr. Mirwais Aktary will be here next Monday March 19th, 2012 and will be available to answer your questions on the system and possible applications for the system within the scope of your nanofabrication work.  All interested parties are invited to attend.

When: 2:00 to 3:00 PM Monday March 19th, 2012
Where:  Allen 101 conference room.

Abstract is below:

RAITH ionLiNE: An Integrated Ion Beam Lithography Platform for Nanofabrication

Lloyd Peto

Product Manager

Ion Beam Lithography Group

Raith  GmbH





With the rapid growth in nanofabrication science and technology, the need for more flexible and direct nano-patterning systems is on the increase, where the typical requirement for such systems is automation; high resolution patterning over large areas; accurate overlay; patterning over long time period, and 3-D nano-structuring. For these demanding tasks, Raith has designed the ionLiNE, which is world’s first dedicated ion beam lithography (IBL) instrument.  IBL patterning does not require resist processes and is enabling a growing range of unique applications that reduce process complexity for rapid prototyping.

This seminar will present an overview of the ionLiNE in terms of its capabilities as an enabling nanofabrication platform and as well discuss the latest results from advanced IBL tasks that have been achieved to date.  These results include batch nanopore fabrication at the wafer level for biomolecule sensing, 3D microfluidic mixing channels, large area diamond film patterning, x-ray zone plates, and large area gratings for photonics and plasmonics.


Date:      Monday March 19, 2012


Time:     2:00 – 3:00 PM


Venue:   Allen 101 Conference Room

["image/gif" not shown]
["application/msword" not shown]