Subject: SEMs of MaN2403 EBL patterns written during "rippling" in the SEM mode
From: James Conway <>
Date: Thu, 06 Mar 2008 12:28:41 -0800

Hello Raith Users:

If you are working on MaN-2403 negative tone resist you may wish to check out the links below.
Together we have been working to optimize the process sheet for Man-2403 in preparation for a new process sheet release due out soon.
Contained therein are some very n
ice patterning results from the RAITH system. 
The google picasa web site is also a very nice platform for reporting, and should be a fine example for us all.

My Hat is off to Rohan,

James Conway
SNF Ebeam Lab

-------- Original Message --------
Subject: SEMs of patterns written during "rippling" in the SEM mode
Date: Fri, 29 Feb 2008 14:40:44 -0800
From: Rohan D. Kekatpure <>
To: James Conway <>
CC: S. Ekin Kocabas <>, Alex R. Guichard <>, Mike Preiner <>

Hi James,

Here are the SEMs of line patterns written during the apparent  
rippling of the focussed dots at high magnification (these were  
written on Tuesday 2/26, 9:00am-1:00 pm session). There is no visible  
effect of the rippling on the actual written patterns. The first set  
of images are resist patterns right after development. As you will  
notice, there is a lot of uncleared scum between the narrow-pitch  
lines. The second set of images is the same resist patterns after they  
have undergone a 30 second oxygen plasma descum in the AMTEther.  
Although I have used AMT for this case, I believe same results can be  
obtained in Drytek#4 or Drytek#1.

Before descum:
After descum:

Although it is important to address the root of the rippling problem,  
it doesnt seem to have an effect on the actual writes (atleast at the  
resolution that we are working at.)