Subject: Using SU-8 as negative resit on Raith
From: Ofer Levi <>
Date: Sat, 25 Mar 2006 22:03:58 -0800

Hey all,
A friend from Caltech told me that they use SU-8 on their modified SEM to 
write e-beam patterns as negative resist.
Their recipe use a rather thick SU-8 resist (1200-1800 nm thick) with 
standard SU-8 developing afterwards. Their resolution is probably only 50 
nm at these thickness values.
Does anyone use SU-8 here on the Raith?
Can someone give me some details about resist type and thickness, 
resolution you get and some details about processing and dose to clear..

Many thanks,


Ofer Levi, 		Ph.D.
Department of Electrical Engineering, Stanford University
CIS-X Rm 310,  Stanford, CA 94305-4075

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