Subject: e-beam lithography presentation
From: Paul Rissman <>
Date: Tue, 22 Feb 2005 09:17:27 -0800

There will be a presentation on electron beam lithography by Dr. Tim Groves 
of Leica on:

                                 Friday, March 4th
                                        1 PM
                                       CIS 101

The abstract is listed below.  Please forward this message on to anyone who 
you think would be interested in the talk.

Paul Rissman

>Recent Progress in Electron Beam Lithography of Nanometer Scale Structures
>Dr. Tim Groves, Director of Technology at Leica Microsystems Lithography,
>and Consulting Professor of Electrical Engineering at Stanford
>E-beam lithography remains the method of choice for fabricating structures
>in the range of 4 nm to 200 nm in size. In additon to having inherently
>high resolution, it has the ability to store and print complex patterns,
>thus avoiding the cost and cycle time of photomasks. Recent years have seen
>an enormous proliferation of commercial and research applications for EBL.
>Dr. Groves will describe some of these, along with the capabilities and
>limitations of the technology. An open discussion of the EBL needs of the
>Stanford community will follow.