raith@snf.stanford.edu: 1229: ZEP very resistant to AMT oxide etch!

Subject: ZEP very resistant to AMT oxide etch!
From: Dan Grupp <grupp@snowmass.stanford.edu>
Date: Fri, 1 Jul 2005 16:20:26 -0700

Want to share a great (and surprising!!) result: ZEP didn't etch in 
the AMT standrad oxide etch for 2.5 minutes, within resolution of 
dektak. The oxide etch performed normally. Rather odd, since nitride 
etch in  P5000 is very fast: 3400A/min of ZEP at low power.
    Does everyone know this already? You're probably already using it 
to make fantastic devices...
    Happy 4th,
Dan
-- 
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Dr. Daniel Grupp, Visiting Scholar
Center for Integrated Systems
Stanford University
Stanford, CA 94305
(650) 724-6911
FAX:  723-4659
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