Subject: Three Beams --- EIPBN 2011 1st Call for Papers
From: "James W. Conway" <>
Date: Thu, 23 Sep 2010 11:40:18 -0700

["multipart/related" not shown] Thu, 23 Sep 2010 11:40:18 -0700

Subject: Three Beams --- EIPBN 2011 1st Call for Papers
From: "James W. Conway" <>
Date: Thu, 23 Sep 2010 11:40:18 -0700

EIPBN 2011 1st Call for Papers   

Greetings Ebeam Community at Stanford:

I encourage you to submit your abstract to the Three Beams reviewing committee.  This is a very high level technical  conference across several disciplines including Electron, Ion, and Photon Beam technologies with several emerging topic areas such as Nano-Imprint, Maskless Lithography, and nanobiology.  I have attended this conference for many years and each year it brings me new exposure to emerging work in the field, new ideas come to me as I sit in the conference sessions, and many opportunities to establish and sustain my network and professional relationships in this broad field.

  The 2011 conference will once again be time well spent and I promise you will never be bored for an instant!  Students in particular are encouraged to submit either a paper, a poster, or both.  Some funds may be available from to assist your attendance and housing during the event with the expectation you are willing to participate in hosting during the topic sessions.  This conference has been well attended by student groups from across the world. There are many opportunities to collaborate between research centers worldwide.  This year the conference location will be in Las Vegas, a fun and cheap city to attend a conference with many ancillary activities available for your enjoyment and recreation.

Please consider your best work for presentation and also please submit your abstracts on time.

All the Best in your Research,

James Conway
Stanford Nanofabrication Facility.

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EIPBN 2011
First Call For Papers

The 55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
May 31 – June 3, 2011, JW Marriot Resort, Las Vegas, Nevada
The World's Leading Symposium on Lithography and Nanofabrication
EIPBN — the ‘THREE-BEAMS’ conference — is recognized as the premier conference dedicated to lithographic sciences and process technologies using election, ion or photon beams, with special emphasis on applications for micro- and nanofabrication techniques. The conference brings together engineers and scientists from all over the world to discuss recent progress and future trends.


On behalf of the organizing committee it is my pleasure to announce the first call for papers for the conference. 
Abstract Submission: January 10 2011
Registration: Open from January 2011
Abstract submission details and further information about the conference can be found at:

Abstracts representing high-quality original research are invited in the following areas:
Micro- and Nanolithography
·         Electron-beam lithography
·         Ion-beam patterning
·         Optical lithography
·         Nano-imprint lithography
·         Extreme UV lithography
·         Masked and maskless lithography
·         Directed self-assembly
·         Novel or emerging lithographic techniques
Process Technologies
·         Electron or ion beam technologies
·         Metrology and imaging
·         Resists
·         Pattern transfer
·         Process simulation and modeling
·         Novel beam-based processing
·         Nanoelectronics
·         Patterned media and data storage
·         Nanophotonics
·         Nanobiology
·         Micro- and nano-fluidics
·         Novel or emerging applications
We look forward to seeing you in Las Vegas!
Richard Blaikie
Program Chair

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Thu, 23 Sep 2010 11:40:18 -0700

Subject: Three Beams --- EIPBN 2011 1st Call for Papers
From: "James W. Conway" <>
Date: Thu, 23 Sep 2010 11:40:18 -0700

["image/gif" not shown] Thu, 23 Sep 2010 11:40:18 -0700