Subject: ANNOUNCEMENT: Take a spin with me Ebeam resist training on the headway spinner. Tuesday 10 am - 1 PM.
From: James Conway <jwc@snf.stanford.edu>
Date: Mon, 27 Jun 2005 11:47:38 -0700
Mon, 27 Jun 2005 11:47:38 -0700

  Greetings RAITH Group XIV and other interested people:


  Please come and 'Take a Spin with Me.'


      I will be conducting  Ebeam Resist Handling on the Headway Spinner
      working with several polymers and you can use this opportunity to
      clean and coat your wafers for your work too!



      I will be starting with wafer cleans for clean level Silicon and
      stripping old resist as well on WBNONMETAL starting at 10 AM then
      starting coating operations from 11 - 12:30.  I have reserved the
      headway from 11 - 1:00 PM for your usage.



      No need to reply to this email -- just show up and learn and get
      qualified on this very useful tool.



Thank you,

james Conway



Greetings RAITH Group XIV and other interested people:

Please come and 'Take a Spin with Me.'


I will be conducting  Ebeam Resist Handling on the Headway Spinner working with several polymers and you can use this opportunity to clean and coat your wafers for your work too!


I will be starting with wafer cleans for clean level Silicon and stripping old resist as well on WBNONMETAL starting at 10 AM then starting coating operations from 11 - 12:30.  I have reserved the headway from 11 - 1:00 PM for your usage.


No need to reply to this email -- just show up and learn and get qualified on this very useful tool.



Thank you,

james Conway