Subject: [Fwd: Raith Micrograph Award 2005 - FINAL REMINDER]
From: James Conway <jwc@snf.stanford.edu>
Date: Tue, 08 Nov 2005 09:29:29 -0800

Greetings Raith Users:

Final reminder on submissions to the Raith Micrograph 2005 contest. Deadline is November 15, 2005.
I was very pleased to see that several Stanford people have submitted some very nice work!

All the best,

James Conway


-------- Original Message --------
Subject: Raith Micrograph Award 2005 - FINAL REMINDER
Date: Tue, 8 Nov 2005 17:27:06 +0100
From: Eggert, Marc <Eggert@Raith.de>
To: <jwc@snf.stanford.edu>


Raith Micrograph Award 2005 - FINAL REMINDER

Dear Raith customer,

The Raith Micrograph Award 2005 will end in 7 days. If you intend to participate in it, please be so obliging as to meet the deadline:

Please send us your results on the 15th November at the latest - thank you very much !


To download registration form, please visit our website (link below). If you should have any questions, please do not hesitate to contact me by phone or e-mail.

With best regards from Dortmund

Marc Eggert
Marketing Assistant
Hauert 18
44227 Dortmund
Germany

phone:  +49 (0)231 975 000-35
fax:      +49 (0)231 975 000-0
email:   eggert@raith.de



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Due to Raith's first Micrograph Award in 2004 attracted a great interest, we are pleased to inform you that Raith arranges the 'MICROGRAPH AWARD 2005' for highly sophisticated scientific application within our customers community. We meanwhile have about 400 active users who are employing Raith lithography products for research and development in a wide range of applications. We are interested in state of the art application materials to include in our application notes, user meetings, and the image gallery on our website (for a selection of contributions from Micrograph Award 2004 please click here <<<http://www.raith.com/WWW_RAITH/nanolithography/nano_imagegallery.html>>>) . We would like to encourage users to share their results with us and the global Raith user community.

Participants should submit one or more images showing nano structures that have been patterned using a Raith E-beam lithography system (e_LiNE, RAITH150, RAITH50 or ELPHY). A brief overview describing the scientific motivation behind the image should be attached along with the user's full contact information. We will also accept images showing patterns that have been created unintentionally as long as they are displaying a unique nano- or microstructure. All Raith E-beam users can participate, except for Raith staff members and Raith partner staff members.

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Please visit Raith website <<<<http://www.raith.com/WWW_RAITH/news/news.html>>>>  for further information and registration.