Subject: Comment raith SNF 2006-01-24 18:26:53: SYSTEM REQUALIFIED -- NO PROBLEMS FOUND
From: James Conway <jwc@snf.stanford.edu>
Date: Tue, 24 Jan 2006 18:35:39 -0800

GREETINGS:

IN REFERENCE TO STITCHING ISSUES REPORTED LAST WEEK, WE HAVE DETERMINED 
THAT THESE RESULTS WERE SIMPLY NEW USER'S WRITE FIELD ALIGNMENT RESULTS 
AND NOT ANY PROBLEMS WITH THE RAITH SYSTEM.

NO ERRORS WERE OBSERVED IN PATTERN PLACEMENT OR WRITE FIELD TO WRITE 
FIELD STITCHING ON THE STANDARD PCM TEST PATTERN SET AT 10 KV, 30 um 
APT. AT 5 mm wORKING DISTANCE.

USERS ARE ENCOURAGED TO ALWAYS CAREFULLY INSPECT THEIR PATTERNS UNDER 
THE OPTICAL MICROSCOPE AND IF NECESSARY THE SEM BEFORE CONTINUING WITH 
PATTERN TRANSFER.

THE RAITH SYSTEM WAS FULLY REQUALIFIED THIS AFTERNOON AND NO PROBLEMS 
WERE OBSERVED. OVERLAY AND EBEAM STITCHING MEASUREMENTS WILL BE 
PERFORMED THURSDAY IF SESSION TIME ALLOWS.
REF: PCM TEST 01242006 ON WAFER 02072005_2 / LOT 10312005 2% 950 K PMMA 
108 nm thickness.

THANK YOU FOR YOUR SUPPORT!

JAMES CONWAY