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Subject: ANNOUNCEMENT: Dr. Freimut Reuther, micro resist technology, presentation on NIL and EBL resist materials THURSDAY 3-30-06 CIS 201 10 - 11 AM.
From: James Conway <jwc@snf.stanford.edu>
Date: Mon, 27 Mar 2006 12:13:47 -0800
Mon, 27 Mar 2006 12:13:47 -0800 
Greetings Raith and Ebeam Communities:

I was able to arrange to have Dr. Freimut Reuther,  Technical Director 
for micro resist technology GmbH. Berlin, Germany to come to Stanford 
during his visit to the USA.  His visit will be Thursday March 30, 2006 
from 10 AM - 12 Noon with a presentation and discussions to be held in 
CIS 201. 

Starting at 10 AM there will be a 40 minute presentation followed by 
discussions regarding products in development at micro resist technology 
GmbH.
Focus of the presentation will be Ormocers and Polymers that can be used 
for thermal nanoimprint lithography and negative tone resists for e-beam 
/ deep UV.

All interested parties within the Stanford Community are welcome to 
attend this meeting.
The conference room has been reserved through Noon for those wishing to 
continue technical discussions after his presentation remarks.

Thank you for your interest in Ebeam Technologies here at Stanford 
Nanofabrication Facility.

James Conway
SNF
650-725-7075
["multipart/related" not shown]
Greetings Raith and Ebeam Communities:

I was able to arrange to have Dr. Freimut Reuther,  Technical Director for micro resist technology GmbH. Berlin, Germany to come to Stanford during his visit to the USA.  His visit will be Thursday March 30, 2006 from 10 AM - 12 Noon with a presentation and discussions to be held in CIS 201. 

Starting at 10 AM there will be a 40 minute presentation followed by discussions regarding products in development at micro resist technology GmbH.
Focus of the presentation will be Ormocers and Polymers that can be used for thermal nanoimprint lithography and negative tone resists for e-beam / deep UV.

All interested parties within the Stanford Community are welcome to attend this meeting.
The conference room has been reserved through Noon for those wishing to continue technical discussions after his presentation remarks.

Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility.

James Conway
SNF
650-725-7075


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