Mon, 27 Mar 2006 12:13:47 -0800
Greetings Raith and Ebeam Communities:
I was able to arrange to have Dr. Freimut Reuther, Technical Director
for micro resist technology GmbH. Berlin, Germany to come to Stanford
during his visit to the USA. His visit will be Thursday March 30, 2006
from 10 AM - 12 Noon with a presentation and discussions to be held in
CIS 201.
Starting at 10 AM there will be a 40 minute presentation followed by
discussions regarding products in development at micro resist technology
GmbH.
Focus of the presentation will be Ormocers and Polymers that can be used
for thermal nanoimprint lithography and negative tone resists for e-beam
/ deep UV.
All interested parties within the Stanford Community are welcome to
attend this meeting.
The conference room has been reserved through Noon for those wishing to
continue technical discussions after his presentation remarks.
Thank you for your interest in Ebeam Technologies here at Stanford
Nanofabrication Facility.
James Conway
SNF
650-725-7075
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Greetings Raith and Ebeam Communities:
I was able to arrange to have
Dr. Freimut Reuther,
Technical Director for
micro resist technology GmbH.
Berlin, Germany to come to Stanford during his visit to the USA. His
visit will be Thursday March 30, 2006 from 10 AM - 12 Noon with a
presentation and discussions to be held in CIS 201.
Starting at 10 AM there will be a 40 minute presentation followed by
discussions regarding products in development at
micro resist
technology GmbH.
Focus of the presentation will be Ormocers and Polymers that can be
used for thermal nanoimprint lithography and negative tone resists for
e-beam / deep UV.
All interested parties within the Stanford Community are welcome to
attend this meeting.
The conference room has been reserved through Noon for those wishing to
continue technical discussions after his presentation remarks.
Thank you for your interest in Ebeam Technologies here at Stanford
Nanofabrication Facility.
James Conway
SNF
650-725-7075
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