Subject: Comment raith SNF 2006-09-13 17:34:21: excellent stitching and resolution on qualification test 9112006
From: James Conway <jwc@snf.stanford.edu>
Date: Wed, 13 Sep 2006 18:08:58 -0700

Greetings Raith Community:
We achieved excellent stitching and resolution on qualification test 
EXPOSURE 9112006 AFTER the system was brought up.

Stitching offsets WF to WF is better than the measurement gage of the 
LEO SEM at < 5 nm.  Single Pixel Lines display superb line edge 
roughness once dose to clear the film is reached.

James Conway