Subject: SPECIAL EVENT TODAY:"'3D EBL applications for UV Nano Imprint Lithography" Guido Piaszenski, Raith GmbH, Dortmund, DE. MONDAY NOV. 13 from 2 - 3 PM in CIS 101
From: James Conway <jwc@snf.stanford.edu>
Date: Mon, 13 Nov 2006 11:21:30 -0800
Mon, 13 Nov 2006 11:21:30 -0800
*ANNOUNCEMENT OF A SPECIAL EBEAM LAB EVENT*

*Monday November 13, 2006 2 - 3 PM CIS 101:*

*"3D EBL Applications for UV Nano Imprint Lithography." *

Guido Piaszenski from Raith GmbH in Dortmund, Germany has graciously 
offered to visit the Stanford Nanofabrication Facility and present his 
group's work which he will also be presenting at the NNT2006 conference 
in San Francisco later that week.

He received his PhD in 2002 at the Ruhr-University of Bochum, Germany 
working with Professor U.K. Köhler.
In 2003 he started working in the application department at Raith GmbH 
in Dortmund Germany developing, testing, and supporting Users working on 
the Raith Electron Beam Lithography Software applications.

This meeting is open to Everyone whom wishes to attend:

    2 - 3 PM     CIS 101:     Presentation followed by Q&A from attendees.
    3 - 4:30 PM CIS 201:     Technical Discussion on NIL and Ebeam 
Lithography topics.

Abstract:

Please feel free to forward this email to people of interest within the 
Stanford Community.



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ANNOUNCEMENT OF A SPECIAL EBEAM LAB EVENT

Monday November 13, 2006 2 - 3 PM CIS 101:

"3D EBL Applications for UV Nano Imprint Lithography."

Guido Piaszenski from Raith GmbH in Dortmund, Germany has graciously offered to visit the Stanford Nanofabrication Facility and present his group's work which he will also be presenting at the NNT2006 conference in San Francisco later that week.

He received his PhD in 2002 at the Ruhr-University of Bochum, Germany working with Professor U.K. Köhler.
In 2003 he started working in the application department at Raith GmbH in Dortmund Germany developing, testing, and supporting Users working on the Raith Electron Beam Lithography Software applications.

This meeting is open to Everyone whom wishes to attend:


    2 - 3 PM     CIS 101:     Presentation followed by Q&A from attendees.
    3 - 4:30 PM CIS 201:     Technical Discussion on NIL and Ebeam Lithography topics.

Abstract:

Please feel free to forward this email to people of interest within the Stanford Community.


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