Subject: Guidelines of Usage for the Ebeam Resist Wet Bench
From: James Conway <jwc@snf.stanford.edu>
Date: Wed, 18 Jul 2007 14:03:46 -0700
Wed, 18 Jul 2007 14:03:46 -0700

*_Guidelines of Usage for the Ebeam Resist Wet Bench_*

James W. Conway
June 14, 2007

The *Ebeam Resist Wet Bench* is dedicated for Ebeam users only in an 
effort to prevent cross contamination and particulates from the Optical 
Lithography processes.

 There is no qualification for use of the Ebeam Wet Bench.
 There is no need to enable on CORAL to utilize this bench for your 
processing.

*_This bench is used for Solvent based Ebeam Resist processing only.
_*
*NO RED OPTICAL resist *are allowed to be used, nor disposed of, on the 
Ebeam Wet Bench.

This bench is to be wiped down with IPA using a wiper before and after 
every use by each User.

No glassware or chemicals are allowed to remain on this bench for any 
period. (> 1 hour)

*Processes* that you would normally use this bench for include:

    * _Ebeam resist development processing._
    * Solvent cleaning of Ebeam engineering materials and substrates.
    * Stripping Ebeam resist from substrates.
    * Processing of small pieces and chips not normally handled easily
      on the other wet benches.


This equipment is in the Gold Contaminated equipment group because it is 
in the Lithography area. However it is up to the individual Lab Member 
to employ his own glassware at an appropriate contamination level for 
their process sequence.

Users encountering any problems, or having any concerns, on this bench 
should report their comments to beamtools@snf.stanford.edu email 
discussion list.

Thank you for your interest in Ebeam Technologies here at the Stanford 
Nanofabrication Facility,

James Conway





Guidelines of Usage for the Ebeam Resist Wet Bench

James W. Conway
June 14, 2007

The Ebeam Resist Wet Bench is dedicated for Ebeam users only in an effort to prevent cross contamination and particulates from the Optical Lithography processes.

 There is no qualification for use of the Ebeam Wet Bench.
 There is no need to enable on CORAL to utilize this bench for your processing.

This bench is used for Solvent based Ebeam Resist processing only.

NO RED OPTICAL resist are allowed to be used, nor disposed of, on the Ebeam Wet Bench.

This bench is to be wiped down with IPA using a wiper before and after every use by each User.

No glassware or chemicals are allowed to remain on this bench for any period. (> 1 hour)

Processes that you would normally use this bench for include:


This equipment is in the Gold Contaminated equipment group because it is in the Lithography area. However it is up to the individual Lab Member to employ his own glassware at an appropriate contamination level for their process sequence.

Users encountering any problems, or having any concerns, on this bench should report their comments to beamtools@snf.stanford.edu email discussion list.

Thank you for your interest in Ebeam Technologies here at the Stanford Nanofabrication Facility,

James Conway



Guidelines of Usage for the Ebeam Resist Wet Bench

Guidelines of Usage for the Ebeam Resist Wet Bench

James W. Conway

June 14, 2007

The Ebeam Resist Wet Bench is dedicated for Ebeam users only in an effort to prevent cross contamination and particulates from the Optical Lithography processes.

 

 There is no qualification for use of the Ebeam Wet Bench.
 There is no need to enable on CORAL to utilize this bench for your processing.

This bench is used for Solvent based Ebeam Resist processing only.

NO RED OPTICAL resist are allowed to be used, nor disposed of, on the Ebeam Wet Bench.

This bench is to be wiped down with IPA using a wiper before and after every use by each User.

No glassware or chemicals are allowed to remain on this bench for any period. (> 1 hour)

Processes that you would normally use this bench for include:


This equipment is in the Gold Contaminated equipment group because it is in the Lithography area. However it is up to the individual Lab Member to employ his own glassware at an appropriate contamination level for their process sequence.

Users encountering any problems, or having any concerns, on this bench should report their comments to beamtools@snf.stanford.edu email discussion list.

Thank you for your interest in Ebeam Technologies here at the Stanford Nanofabrication Facility,

James Conway


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