Subject: Reminder "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway. TODAY! Tuesday September 25th 2007 from 10:15 - 13:00
From: James Conway <jwc@snf.stanford.edu>
Date: Tue, 25 Sep 2007 08:59:39 -0700
Tue, 25 Sep 2007 08:59:39 -0700
Just a reminder that we will start at 10:15 AM at Wet bench nonmetal for 
Silicon substrate cleans and then move onto the Headway Spinner at 11:00.
All interested parties are welcome.
>
>
> -------- Original Message --------
>
> *Subject: *
>
> 	
>
> ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training 
> on the Headway. Tuesday September 11 and 25th 2007 from 10:00 - 13:00
>
> *Date: *
>
> 	
>
> Wed, 29 Aug 2007 16:37:18 -0700
>
> *From: *
>
> 	
>
> James Conway <jwc@snf.stanford.edu> <mailto:jwc@snf.stanford.edu>
>
> *Organization: *
>
> 	
>
> Stanford Nanofabrication Facility - Stanford University
>
> *To: *
>
> 	
>
> Ebeam List <ebeam@snf.stanford.edu> <mailto:ebeam@snf.stanford.edu>, 
> Raith SNF Mailing list <raith@snf.stanford.edu> 
> <mailto:raith@snf.stanford.edu>, beamtools@snf.stanford.edu 
> <mailto:beamtools@snf.stanford.edu>, headway2@snf.stanford.edu 
> <mailto:headway2@snf.stanford.edu>
>
>  
>
> *ANNOUNCEMENT:  "Take A Spin with Me" -- Resist Handling Training on 
> the Headway Coater.*
>
>
> Greetings Ebeam Lab Users,
>
> I will be conducting my bi-monthly *"Take A Spin with Me" *training 
> class Tuesday September 11 and 25th, 2007 from 10:15 AM  - 1 PM. There 
> is a sign up sheet posted on the white board in my office if you 
> desire to sign up in advance.
>
> This is a great opportunity for you to get acquainted with the 
> specific points to employ when working with our Ebeam or Optical 
> Resist materials in order to obtain high quality thin film coatings 
> over your wafers for Electron Beam, Scanning Probe (SPL), and optical 
> Nano-Lithography. These applications accurate control of polymer 
> thickness is important in order to obtain consistent high quality 
> lithography results.
>
> We will be conducting this training on the Headway Spin Coater and 
> users attending this session will gain their qualification on this 
> tool and also learn to perform thin film measurements on the Nanospec 
> TFA measurement tool.
>
> Schedule of Events:
>
> 10 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL 
> performing Pirhana substrate cleans and HF etching of the intrinsic 
> native oxide on Silicon wafers.  All users are encouraged to have 
> their substrates cleaned and ready to go for spinning by the session 
> time; either coming out of the 150 degree Singe oven, or if you are 
> working on oxides or nitrides, coming out of the YES HMDS Prime oven 
> directly.
>
> 11:00 - 12:30 We can apply what ever Ebeam or Optical Resist system 
> you desire for your work.
>
> 12:30 - 1:00 Thin Film Measurements on the Nanospec Thin Film Analyzer
>
> All interested parties are welcome to attend this session.
> This is a Hands-On Lab Session  so please have you substrates clean 
> and ready to coat on the Headway Spin Coater.
> Thank you for your interest in Ebeam Technologies here at Stanford 
> Nanofabrication Facility,
>
> James W. Conway
> Ebeam Technology Group
> Stanford Nanofabrication Facility
> 650-725-7075  office hour M-F 8:30 - 9:30 AM CIS 31
>


Just a reminder that we will start at 10:15 AM at Wet bench nonmetal for Silicon substrate cleans and then move onto the Headway Spinner at 11:00.
All interested parties are welcome.


-------- Original Message --------

Subject:

ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway. Tuesday September 11 and 25th 2007 from 10:00 - 13:00

Date:

Wed, 29 Aug 2007 16:37:18 -0700

From:

James Conway <jwc@snf.stanford.edu>

Organization:

Stanford Nanofabrication Facility - Stanford University

To:

Ebeam List <ebeam@snf.stanford.edu>, Raith SNF Mailing list <raith@snf.stanford.edu>, beamtools@snf.stanford.edu, headway2@snf.stanford.edu

 

ANNOUNCEMENT:  "Take A Spin with Me" -- Resist Handling Training on the Headway Coater.


Greetings Ebeam Lab Users,


I will be conducting my bi-monthly "Take A Spin with Me" training class Tuesday September 11 and 25th, 2007 from 10:15 AM  - 1 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance.

This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. These applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results.

We will be conducting this training on the Headway Spin Coater and users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool.

Schedule of Events:


10 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers.  All users are encouraged to have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly.

11:00 - 12:30 We can apply what ever Ebeam or Optical Resist system you desire for your work.

12:30 - 1:00 Thin Film Measurements on the Nanospec Thin Film Analyzer


All interested parties are welcome to attend this session.
This is a Hands-On Lab Session  so please have you substrates clean and ready to coat on the Headway Spin Coater.
Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility,

James W. Conway
Ebeam Technology Group
Stanford Nanofabrication Facility
650-725-7075  office hour M-F 8:30 - 9:30 AM CIS 31