Subject: TODAY -- Friday March 28, 2008 RAITH USA presentation to discuss applications and capabilities of their new Ion LiNE nano-FIB. tool -- CIS 101 10:00 - 10:40 AM
From: James Conway <jwc@snf.stanford.edu>
Date: Fri, 28 Mar 2008 09:09:14 -0800
Fri, 28 Mar 2008 09:09:14 -0800
Greetings Raith,  Ebeam, and SNF Lab members:

Today, Friday March 28, 2008  in CIS 101 from 10:00 - 10:40 AM

We will be having several members of RAITH, both from Dortmund, Germany 
and the USA visit SNF to discuss potential applications and review the 
capabilities of their new ionLiNE nano-FIB system.  This new system is a 
result of an extensive collaborative effort in Europe between a number 
of companies and universities. http://www.nanofib.com/

Within this project this team have made some remarkable innovations in 
developing a new class of FIB tool that can provide a new avenue of 
nanofabrication patterning as we move into truly nano-scale device 
dimensions. All Users and Lab Members wishing to learn more, or to 
discuss potential new applications or fabrication questions using these 
tools are welcome to attend.  This could become an opportunity for 
researchers at Stanford to get some samples run to test your ideas and 
develop novel application of the tool for your work.

This is NOT just another Focused Ion Beam tool...

Everyone is welcome.

Thank you,

James Conway
650-725-7075



The Raith ionLiNE is an advanced focused ion-beam nanofabrication 
instrument designed and characterized to meet lithography tool 
standards.  The unique components are the patented NanoFIB column, the 
ELPHY pattern generator, the laser interferometer stage, and a complete 
lithography software package, all integrated into one system to enable 
advanced ion-beam patterning. The ion-beam source and column produce the 
beam stability required for automated advanced lithography.  With a 
small beam diameter and nominal beam tails, the focused ion-beam offers 
high lateral selectivity, enabling fabricated feature sizes of 10 
nanometers and below.  Exposures are made in a variety of scan modes 
using a high speed 16-bit pattern generator. The pattern generator 
technology enables nanosecond ion dose control and 3D grey level 
patterning. For applications covering areas larger than a single 
exposure field, the laser interferometer stage provides positioning 
resolution of 1 nm.  With these unique features, the ionLiNE delivers 
critical lithography specifications, such as stitching and overlay 
accuracies.  The lithography software permits the generation or import 
of complex patterns in the widely accepted GDSII data format, job 
automation for overnight patterning without user interaction, automated 
dose control, metrology, and automated focus control via height sensing 
schemes.  Fixed Beam Moving Stage (FBMS), a zero stitching error writing 
mode for the seamless exposure of extended structures, completes the 
advanced patterning of the ionLiNE.  Additional options, such as a 
gas-injection system and nanomanipulators, can be added to allow unique 
nanofabrication and nanoengineering capabilities.










Greetings Raith,  Ebeam, and SNF Lab members:

Today, Friday March 28, 2008  in
CIS 101 from 10:00 - 10:40 AM

We will be having several members of RAITH, both from Dortmund, Germany and the USA visit SNF to discuss potential applications and review the capabilities of their new ionLiNE nano-FIB system.  This new system is a result of an extensive collaborative effort in Europe between a number of companies and universities. http://www.nanofib.com/

Within this project this team have made some remarkable innovations in developing a new class of FIB tool that can provide a new avenue of nanofabrication patterning as we move into truly nano-scale device dimensions. All Users and Lab Members wishing to learn more, or to discuss potential new applications or fabrication questions using these tools are welcome to attend.  This could become an opportunity for researchers at Stanford to get some samples run to test your ideas and develop novel application of the tool for your work.

This is NOT just another Focused Ion Beam tool...


Everyone is welcome.

Thank you,

James Conway
650-725-7075



The Raith
ionLiNE
is an advanced focused ion-beam nanofabrication instrument designed and characterized to meet lithography tool standards.  The unique components are the patented NanoFIB column, the ELPHY pattern generator, the laser interferometer stage, and a complete lithography software package, all integrated into one system to enable advanced ion-beam patterning. The ion-beam source and column produce the beam stability required for automated advanced lithography.  With a small beam diameter and nominal beam tails, the focused ion-beam offers high lateral selectivity, enabling fabricated feature sizes of 10 nanometers and below.  Exposures are made in a variety of scan modes using a high speed 16-bit pattern generator. The pattern generator technology enables nanosecond ion dose control and 3D grey level patterning. For applications covering areas larger than a single exposure field, the laser interferometer stage provides positioning resolution of 1 nm.  With these unique features, the ionLiNE delivers critical lithography specifications, such as stitching and overlay accuracies.  The lithography software permits the generation or import of complex patterns in the widely accepted GDSII data format, job automation for overnight patterning without user interaction, automated dose control, metrology, and automated focus control via height sensing schemes.  Fixed Beam Moving Stage (FBMS), a zero stitching error writing mode for the seamless exposure of extended structures, completes the advanced patterning of the ionLiNE.  Additional options, such as a gas-injection system and nanomanipulators, can be added to allow unique nanofabrication and nanoengineering capabilities.









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