Subject: RAITH GROUP XXXII: BASIC USERS CLASS -- FOUR DAY INTENSIVE SHORT COURSE resumes today at 10 AM in the Ebeam Lab
From: James Conway <jwc@snf.stanford.edu>
Date: Thu, 24 Apr 2008 09:12:55 -0700
Thu, 24 Apr 2008 09:12:55 -0700
Greetings RAITH Group XXXII:*
**
*

Thank you for your understanding in the interruption to our schedule and 
plan yesterday. These complex electro-mechanical systems can be a 
challenge to keep up all the time.
I spend much of yesterday bringing the tool back up after repairs to the 
XY stage and many of the problems we encountered in our session on 
Tuesday afternoon have been resolved.

 We will resume the RAITH Basic Users Class this morning at 10 AM in the 
Ebeam Lab. We will develop out the wafer that we wrote and set the 
system up for another exposure and begin working doing exposures in 
overlay to the patterns we wrote Tuesday evening.


Thank you for your support!

James Conway




Greetings RAITH Group XXXII:

Thank you for your understanding in the interruption to our schedule and plan yesterday. These complex electro-mechanical systems can be a challenge to keep up all the time.
I spend much of yesterday bringing the tool back up after repairs to the XY stage and many of the problems we encountered in our session on Tuesday afternoon have been resolved.

 We will resume the RAITH Basic Users Class this morning at 10 AM in the Ebeam Lab. We will develop out the wafer that we wrote and set the system up for another exposure and begin working doing exposures in overlay to the patterns we wrote Tuesday evening.


Thank you for your support!

James Conway