Subject: STITCHING AND OVERLAY DEMONSTRATION AND HOW TO USE THE METROLOGY PKG. ON RAITH STARTING IN 10 MINUTES.
From: James Conway <jwc@snf.stanford.edu>
Date: Thu, 02 Oct 2003 15:32:53 -0700

                                                                                                        OCTOBER 2, 2003: 1530 HOURS.
HELLO:
 

USERS INTERESTED IN LEARNING MORE ABOUT STITCHING AND OVERLAY METROLOGY USING THE RAITH 150 METROLOGY PACKAGE SHOULD COME DOWN TO THE EBEAM LAB.

WE WILL BE STARTING ONCE WE GET A NEW SAMPLE INSIDE.

THIS IS A FANTASTIC OPPORTUNITY TO TRAIN WITH THE EXPERTS WITH RAITH.
YOU CAN COME WITH OTHER EXPOSURE AND EBL QUESTIONS FOR DISCUSSIONS WHILE WE ARE WRITING OUR STITCH AND OVERLAY PATTERNS.
DON'T PASS IT UP!

THANK YOU,

JAMES CONWAY