Subject: Re: STITCHING AND OVERLAY DEMONSTRATION AND HOW TO USE THE METROLOGY PKG. ON RAITH STARTING IN 10 MINUTES.
From: Mark Topinka <mtopinka@stanford.edu>
Date: Thu, 02 Oct 2003 16:33:14 -0700

Hi James-
     I'm sorry about today, something urgent came up.  I will plan on being 
there for most of tomorrow afternoon.  -Mark

At 03:32 PM 10/2/2003 -0700, James Conway wrote:
> 
>OCTOBER 2, 2003: 1530 HOURS.
>HELLO:
>
>
>USERS INTERESTED IN LEARNING MORE ABOUT STITCHING AND OVERLAY METROLOGY 
>USING THE RAITH 150 METROLOGY PACKAGE SHOULD COME DOWN TO THE EBEAM LAB.
>
>WE WILL BE STARTING ONCE WE GET A NEW SAMPLE INSIDE.
>
>THIS IS A FANTASTIC OPPORTUNITY TO TRAIN WITH THE EXPERTS WITH RAITH.
>YOU CAN COME WITH OTHER EXPOSURE AND EBL QUESTIONS FOR DISCUSSIONS WHILE 
>WE ARE WRITING OUR STITCH AND OVERLAY PATTERNS.
>DON'T PASS IT UP!
>
>THANK YOU,
>
>JAMES CONWAY
>
>