Subject: [Fwd: EIPBN (Marco Island FL) abstract deadline: Jan 9]
From: James Conway <jwc@snf.stanford.edu>
Date: Tue, 16 Dec 2008 17:23:07 -0800
Tue, 16 Dec 2008 17:23:07 -0800
Its that time again -- time to get the Three Beams abstracts submitted.

Happy Holidays

James

-------- Original Message --------
Subject: 	EIPBN (Marco Island FL) abstract deadline: Jan 9
Date: 	Mon, 15 Dec 2008 13:21:58 -0500
From: 	eipbn@gir.eng.yale.edu
To: 	jwc@snf.stanford.edu



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eipbn
<http://eipbn.org>
M A R C O  I S L A N D  M A R R I O T T  B E A C H  R E S O R T
F L O R I D A,    M A Y   26 - 29   2 0 0 9   E I P B N . O R G 
<http://eipbn.org>
<http://eipbn.org>
*
*Dear Colleague,

The EIPBN, or 3-Beams, Conference, now in its 50th year, is the premier 
conference on the science and technology of lithography and 
nanofabrication. Stephen Chou and I are honored to serve as the 
Conference and Program Chairs, respectively, and would like to invite 
you to participate in the meeting.  This year the conference celebrates 
the 50th anniversary of Feynman's 1959 lecture, "There is Plenty of Room 
at the Bottom."  

The site of this conference is at the lovely resort of  Marco Island, 
Florida. This is the final call for papers. Abstracts for papers are due 
on Friday, January 9, 2009 and can be submitted and reviewed on-line. 
Visit eipbn.org <http://eipbn.org/> to submit your abstract.

Details of the conference and call for papers can be found on our web 
site or in the tri-fold PDF printable document. 
<http://eipbn.com/EIPBN2009_FinalCall.pdf> Please mark your calendar for 
the dates between May 26-29, 2009. We look forward to seeing you in Florida!

 

Sincerely,

Elizabeth Dobisz and Stephen Chou

 

*Stephen Chou*


Joseph C. Elgin Professor of Engineering
B412 Engineering Quad
Princeton University
Princeton, NJ 08544
Phone: 609-258-4416
E-mail: chou@princeton.edu <mailto:chou@princeton.edu>

 

*Elizabeth Dobisz*

Hitachi San Jose Research Center
3403 Yerba Buena Rd.
San Jose, CA 95135
Phone: 408-717-5492
Fax: 408-717-9066
E-mail: e.dobisz@gmail.com <mailto:e.dobisz@gmail.com>

 


*The 53rd International Conference on Electron, Ion, and Photon Beam 
technology and**Nanofabrication,
**Marco Island, Florida, May 26 - May 29, 2009
**ANNOUNCEMENT*



        *Background*

The EIPBN Conference is recognized as the foremost international meeting 
dedicated to lithographic science and process technology and its use in 
micro and nanofabrication techniques and their applications.  The 
conference brings together engineers and scientists from industries and 
universities from all over the world to discuss recent progress and 
future trends.

The EIPBN conference is incorporated as a nonprofit organization in the 
state of New Jersey and is co-sponsored by the American Vacuum Society 
(www.avs.org <http://www.avs.org/>), in cooperation with the IEEE 
Electron Devices and Lasers and Electrooptics Societies and the Optical 
Society of America.  It is organized by a steering committee that elects 
two new members each year from those that regularly attend the conference. 


        *Format*

The conference opens on Tuesday afternoon with a special commercial 
session which features vendors of materials and equipment relevant to 
the conference. The plenary session is on Wednesday morning.  The 
remainder of the conference is organized in two parallel sessions.  The 
length of presentation and discussion is 30 minutes for invited papers 
and 20 minutes for contributed papers.

A special feature of the technical program is the poster session that 
includes invited and contributed papers.  There is only one poster 
session, but posters will be displayed for informal viewing throughout 
the entire conference.  No distinction is made between the importance of 
poster and oral presentations.

 


        *Technical Scope*


Abstracts representing high quality original research are invited in the 
following areas: Immersion and EUV lithography Electron and ion beam 
lithography Sub-half wavelength "super resolution" optical lithography 
Photon- and charged-particle optics Metrology and alignment Resists and 
resist processing Plasma etching and deposition Nanofabrication 
techniques   Maskless lithography Nanoimprint lithography, embossing and 
soft lithography

Topics in nanofabrication and emerging technologies include:

    * Simulation and computer aided design for the Nanoscale Era
    * Nanophotonic devices Nanomagnetic devices
    * Novel ultrahigh density data storage devices
    * Molecular and low-dimensional nano-electronics
    * Bio-nanotechnology & hybrid bio/solid state devices
    * Micro and nano-scaled MEMS
    * Nanoparticle synthesis and assembly
    * Self-assembly and directed self-assembly
    * Nanofabrication for energy sources
    * Atomic and Molecular manipulation
    * Optical tweezers



        *Conference Registration*


We strongly encourage you to register on line by using our website 
*www.eipbn.org.* <http://www.eipbn.org/>*  *Early registration and 
special student rates are available.

The early registration deadline is May 16, 2009.



        *Conference Location*


*Marco Island Marrott Beach Resort**400 S Collier Blvd**Marco Island, FL 
34145*
*Phone:  (239) 394-2511* 
*Fax:  (239) 642-2672
*www.marcoislandmarriott.com <http://www.marcoislandmarriott.com/> 

*On-line hotel registration is available on the EIPBN website*

 


        *Abstract Submission*

The quality of the abstracts will form the basis for selection of papers 
for the conference and will be peer reviewed according to the following 
criteria:

    Originality of work
    Specific results achieved and described
    Potential impact and interest to the attendees


*Abstracts should be submitted online at **www.eipbn.org* 
<http://www.eipbn.org/>
Abstracts are limited to one page of text (12 point or larger type) and 
a second, optional page with up to four figures.
*Abstract deadline: January 9, 2009*

Late submissions may be considered but only if they report truly 
outstanding results. Please prepare abstracts carefully and describe 
accomplishments specifically.  Authors will be notified of acceptance by 
April 11, 2009.  Earlier notification will be provided to those authors 
providing an e-mail address.

 

*Micrograph Contest*

On a less technical level, EIPBN offers the opportunity to immortalize 
your favorite micrograph(s).  Categories and previous winners are 
described on our website.

 

*Manuscript Submission*

Manuscripts must be submitted at the conference and will be subjected to 
a critical peer review before they can be accepted for publication in 
the Nov/Dec 2009 issue of the Journal of Vacuum Science and Technology. 
Please note that authors are required to pay a publication charge of 
about $100 per page.

 

*Student Support*

Limited funds are available to support student travel. The Conference 
Chair must receive a letter requesting support from the student's 
advisor by January 9, 2009.

 


        Conference Chair

Stephen Y. Chou
Joseph C. Elgin Professor of Engineering
B412 Engineering Quad
Princeton University
Princeton, NJ 08544
Phone: 609-258-4416
E-mail: chou@princeton.edu <mailto:chou@princeton.edu>

 


        Program Chair

Elizabeth A. Dobisz
Hitachi San Jose Research Center
3403 Yerba Buena Rd.
San Jose, CA 95135
Phone: 408-717-5492
Fax:   408-717-9066
E-mail:  e.dobisz@gmail.com <mailto:e.dobisz@gmail.com>

 


*To add your name to the mailing list, please mail a business card or 
e-mail to the Conference Chair.*

*Conference Site and Area Attractions*The 2009 conference will be held 
at the Marco Island Marriott Beach Resort.  The resort is on the beach 
on the Gulf of Mexico coast of Florida.  Golf, tennis, swimming, 
boating, and snorkeling are on location.  Restaurants, shopping and 
parks are nearby.  It is accessible from three major airports.  It is a 
relaxing paradise location for everyone.

The conference rate is available on the weekends before and after the 
conference to accommodate EIPBN attendees.
For more information visit:


    www.marcoislandmarriott.com <http://www.marcoislandmarriott.com/>
    www.marcoislandcity.com <http://www.marcoislandcity.com/>
    www.marcoislandonline.com <http://www.marcoislandonline.com/>

     



Its that time again -- time to get the Three Beams abstracts submitted.

Happy Holidays

James

-------- Original Message --------
Subject: EIPBN (Marco Island FL) abstract deadline: Jan 9
Date: Mon, 15 Dec 2008 13:21:58 -0500
From: eipbn@gir.eng.yale.edu
To: jwc@snf.stanford.edu


click here and send
any blank message to
get off this mailing list


eipbn

M A R C O  I S L A N D  M A R R I O T T  B E A C H  R E S O R T
F L O R I D A,    M A Y   26 - 29   2 0 0 9   E I P B N . O R G



Dear Colleague,

The EIPBN, or 3-Beams, Conference, now in its 50th year, is the premier conference on the science and technology of lithography and nanofabrication. Stephen Chou and I are honored to serve as the Conference and Program Chairs, respectively, and would like to invite you to participate in the meeting.  This year the conference celebrates the 50th anniversary of Feynman's 1959 lecture, "There is Plenty of Room at the Bottom."  

The site of this conference is at the lovely resort of  Marco Island, Florida. This is the final call for papers. Abstracts for papers are due on Friday, January 9, 2009 and can be submitted and reviewed on-line. Visit eipbn.org to submit your abstract.

Details of the conference and call for papers can be found on our web site or in the tri-fold PDF printable document. Please mark your calendar for the dates between May 26-29, 2009. We look forward to seeing you in Florida!

 

Sincerely,

Elizabeth Dobisz and Stephen Chou

 

Stephen Chou


Joseph C. Elgin Professor of Engineering
B412 Engineering Quad
Princeton University
Princeton, NJ 08544
Phone: 609-258-4416
E-mail: chou@princeton.edu

 

Elizabeth Dobisz

Hitachi San Jose Research Center
3403 Yerba Buena Rd.
San Jose, CA 95135
Phone: 408-717-5492
Fax: 408-717-9066
E-mail: e.dobisz@gmail.com

 


The 53rd International Conference on Electron, Ion, and Photon Beam technology andNanofabrication,
Marco Island, Florida, May 26 - May 29, 2009
ANNOUNCEMENT


Background

The EIPBN Conference is recognized as the foremost international meeting dedicated to lithographic science and process technology and its use in micro and nanofabrication techniques and their applications.  The conference brings together engineers and scientists from industries and universities from all over the world to discuss recent progress and future trends.

The EIPBN conference is incorporated as a nonprofit organization in the state of New Jersey and is co-sponsored by the American Vacuum Society (www.avs.org), in cooperation with the IEEE Electron Devices and Lasers and Electrooptics Societies and the Optical Society of America.  It is organized by a steering committee that elects two new members each year from those that regularly attend the conference. 

Format

The conference opens on Tuesday afternoon with a special commercial session which features vendors of materials and equipment relevant to the conference. The plenary session is on Wednesday morning.  The remainder of the conference is organized in two parallel sessions.  The length of presentation and discussion is 30 minutes for invited papers and 20 minutes for contributed papers.

A special feature of the technical program is the poster session that includes invited and contributed papers.  There is only one poster session, but posters will be displayed for informal viewing throughout the entire conference.  No distinction is made between the importance of poster and oral presentations.

 

Technical Scope


Abstracts representing high quality original research are invited in the following areas: Immersion and EUV lithography Electron and ion beam lithography Sub-half wavelength "super resolution" optical lithography Photon- and charged-particle optics Metrology and alignment Resists and resist processing Plasma etching and deposition Nanofabrication techniques   Maskless lithography Nanoimprint lithography, embossing and soft lithography

Topics in nanofabrication and emerging technologies include:


Conference Registration


We strongly encourage you to register on line by using our website www.eipbn.org.  Early registration and special student rates are available.

The early registration deadline is May 16, 2009.



Conference Location


Marco Island Marrott Beach Resort400 S Collier BlvdMarco Island, FL 34145
Phone:  (239) 394-2511 
Fax:  (239) 642-2672
www.marcoislandmarriott.com 

On-line hotel registration is available on the EIPBN website

 

Abstract Submission

The quality of the abstracts will form the basis for selection of papers for the conference and will be peer reviewed according to the following criteria:

Originality of work
Specific results achieved and described
Potential impact and interest to the attendees


Abstracts should be submitted online at www.eipbn.org
Abstracts are limited to one page of text (12 point or larger type) and a second, optional page with up to four figures.
Abstract deadline: January 9, 2009

Late submissions may be considered but only if they report truly outstanding results. Please prepare abstracts carefully and describe accomplishments specifically.  Authors will be notified of acceptance by April 11, 2009.  Earlier notification will be provided to those authors providing an e-mail address.

 

Micrograph Contest

On a less technical level, EIPBN offers the opportunity to immortalize your favorite micrograph(s).  Categories and previous winners are described on our website.

 

Manuscript Submission

Manuscripts must be submitted at the conference and will be subjected to a critical peer review before they can be accepted for publication in the Nov/Dec 2009 issue of the Journal of Vacuum Science and Technology. Please note that authors are required to pay a publication charge of about $100 per page.

 

Student Support

Limited funds are available to support student travel. The Conference Chair must receive a letter requesting support from the student's advisor by January 9, 2009.

 

Conference Chair

Stephen Y. Chou
Joseph C. Elgin Professor of Engineering
B412 Engineering Quad
Princeton University
Princeton, NJ 08544
Phone: 609-258-4416
E-mail: chou@princeton.edu

 

Program Chair

Elizabeth A. Dobisz
Hitachi San Jose Research Center
3403 Yerba Buena Rd.
San Jose, CA 95135
Phone: 408-717-5492
Fax:   408-717-9066
E-mail:  e.dobisz@gmail.com

 


To add your name to the mailing list, please mail a business card or e-mail to the Conference Chair.

Conference Site and Area AttractionsThe 2009 conference will be held at the Marco Island Marriott Beach Resort.  The resort is on the beach on the Gulf of Mexico coast of Florida.  Golf, tennis, swimming, boating, and snorkeling are on location.  Restaurants, shopping and parks are nearby.  It is accessible from three major airports.  It is a relaxing paradise location for everyone.

The conference rate is available on the weekends before and after the conference to accommodate EIPBN attendees.
For more information visit:


www.marcoislandmarriott.com
www.marcoislandcity.com
www.marcoislandonline.com