Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training classes on the Headway for June and July 2009
From: James Conway <jwc@snf.stanford.edu>
Date: Mon, 22 Jun 2009 13:29:53 -0700
Mon, 22 Jun 2009 13:29:53 -0700
*

**ANNOUNCEMENT:  "Take A Spin with Me" -- Resist Handling Training on 
the Headway Coater.
*
Greetings SNF Lab Users,

I will be conducting my next *"Take A Spin with Me" *training classes 
Tuesday June  23rd, 2009 from 10:15 AM  - 12:30 PM.   Next Month in June 
I will be holding the same class on July 14th and 28rd, 2009 at the same 
times.

This is a great opportunity for you to get acquainted with the specific 
points to employ when working with our Ebeam or Optical Resist materials 
in order to obtain high quality thin film coatings over your wafers for 
Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these 
applications accurate control of polymer thickness is important in order 
to obtain consistent high quality lithography results.

We will be conducting this training on the Headway Spin Coater.  Users 
attending this session will gain their qualification on this tool and 
also learn to perform thin film measurements on the Nanospec TFA 
measurement tool.
This is a Hands-On Lab Session, please have your substrates clean and 
ready to coat on the Headway Coater.

Class Schedule:

10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL 
performing Pirhana clean and HF etching of the intrinsic native oxide on 
Silicon wafers.  All users must have their substrates cleaned and ready 
to go for spinning by the session time; either coming out of the 150 
degree Singe oven, or if you are working on oxides or nitrides, coming 
out of the YES HMDS Prime oven directly.

11:00 - 12:00 We can apply what ever resist system you desire for your 
work.

12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer

All interested parties are welcome to attend this session.
Thank you for your interest in Ebeam and Optical Lithography at Stanford 
Nanofabrication Facility,

James W. Conway
Ebeam Technology Group
Stanford Nanofabrication Facility
650-725-7075  office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31

p.s. If you have already qualified on the tool please just reply 
qualified in the subject line and I will take you off the to-be-trained 
listing I have maintained on my PC.





ANNOUNCEMENT:  "Take A Spin with Me" -- Resist Handling Training on the Headway Coater.

Greetings SNF Lab Users,


I will be conducting my next
"Take A Spin with Me" training classes Tuesday June  23rd, 2009 from 10:15 AM  - 12:30 PM.   Next Month in June I will be holding the same class on July 14th and 28rd, 2009 at the same times.

This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results.

We will be conducting this training on the Headway Spin Coater.  Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool.
This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater.

Class Schedule:

10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana clean and HF etching of the intrinsic native oxide on Silicon wafers.  All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly.

11:00 - 12:00 We can apply what ever resist system you desire for your work.

12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer


All interested parties are welcome to attend this session.
Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility,

James W. Conway
Ebeam Technology Group
Stanford Nanofabrication Facility
650-725-7075  office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31

p.s. If you have already qualified on the tool please just reply qualified in the subject line and I will take you off the to-be-trained listing I have maintained on my PC.