Subject: I am working to upgrade our RAITH 150 Software and Hardware to the version 5 release. Please lend me your support in this effort!
From: "James W. Conway" <jwc@snf.stanford.edu>
Date: Thu, 04 Mar 2010 14:53:23 -0800

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Subject: I am working to upgrade our RAITH 150 Software and Hardware to the version 5 release. Please lend me your support in this effort!
From: "James W. Conway" <jwc@snf.stanford.edu>
Date: Thu, 04 Mar 2010 14:53:23 -0800



Good Morning Raith Community:

Over the course of the last six months I have been working closely with RAITH USA Inc. and SNF Management towards getting funding to upgrade the RAITH 150 system to the version 5 release.  This upgrade involves upgrading several hardware sub-systems and a significant upgrade of the RAITH 150 version Software.
I have negotiated a significant discount for this package from the list price with RAITH USA Inc. and hope to complete this upgrade in the coming month.

I desire your support for this upgrade as it will bring onto the system many significant additional SW features and enhancements to aid your research. Many of the original ideas for these features had been requested by Stanford Students and myself working in collaborative efforts with RAITH which  have been incorporated into the version 5 software release.  Below is the short version listing of features that will come within this upgrade package for your comment and review.

Thank you for your support!

James Conway
Ebeam Lab
SNF



Key benefits of Raith software release 5:


1. New: Control bar = clean User Interface, much better overview and more space on your
desktop
2. New: Column control = GUI for adjusting, reading, saving and setting of column
parameters possible (directly, via PLS, via macros) (only for Raith systems)
3. NanoPECs = new powerful proximity effect package, energy density simulation
and Monte Carlo simulation including the ability to perform EPC on Single Pixel Lines and Dot arrays.
4. New: Bitmap exposure = import images into GDSII to expose them in 3D
5. New: powerful protocol tool = detailed log file about all important steps or
modifications on your Raith product (change user / new parameter set / exposure
time / …) with powerful text export function
6. New: Drag&Drop of coordinates from Position list to Adjust UVW window possible
7. New: Raith attachment driver for Hitachi S4500
8. New: graphical sample navigation based on original CAD drawings of sample
holders
9. New: server license introduced = floating software licenses based on a server
hard lock key are possible
10. In combination with pattern generator version 7 more than double speed for
image/mark acquisition
11. Fully automated drift compensation with GUI = correction for Beam current, beam
position, gun parameters
12. Enhanced automatic pattern/mark recognition (on images)
13. Adaptive stage speed via joystick = stage speed automatically adapts to current
write field (only for Raith systems)
14. Enhanced cross section simulation for GDSII files
15. DualBeam separate FOV support for Raith attachments products introduced
16. Software screen resolution adapted to high resolution wide screens (1680*1050
pixels are standard from now on)
17. Writefield alignment accuracy greatly enhanced (new multi point alignment and
higher mathematical accuracy)
18. Enhanced RAITH150-TWO load lock process

Thu, 04 Mar 2010 14:53:23 -0800

Subject: I am working to upgrade our RAITH 150 Software and Hardware to the version 5 release. Please lend me your support in this effort!
From: "James W. Conway" <jwc@snf.stanford.edu>
Date: Thu, 04 Mar 2010 14:53:23 -0800

["image/gif" not shown] Thu, 04 Mar 2010 14:53:23 -0800