Subject: UPDATE: RAITH Group II A TRAINING DATE change announcement
From: James Conway <jwc@snf.stanford.edu>
Date: Fri, 18 Apr 2003 11:11:16 -0700
Fri, 18 Apr 2003 11:11:16 -0700
I have changed the date of the June Class to June 17 - 20, 2003 to
better meet scheduling needs.  There will also be several training
opportunities over the summer.


>
>
> RAITH GROUP II TRAINING ANNOUNCEMENT:
> The next RAITH GROUP II  will begin training over a number of sessions
> broken into three groups:
>
> Advanced Hitachi Users, Intensive Short Course, the week of April 28,
> 2003.
> The next main Group II Users beginning the week of May 11, 2003
> The second Group II A Users beginning the week of June 17, 2003.
>
> These classes will involve a day of lecture and demo and three days of
> hands-on training. This will be followed by sessions of smaller
> breakout groups based on your application in the week to follow.
> The goal is to get all qualified advanced Hitachi Ebeam users whom
> desire access to the RAITH trained and on the system over the summer
> until we reach capacity on this system.
>
> Please see James Conway during my office hour for more information or
> to sign up for training.
>
>
> Thank you for your interest in E-beam Lithography and SEM at SNF!

James Conway
650-725-7075




I have changed the date of the June Class to June 17 - 20, 2003 to better meet scheduling needs.  There will also be several training opportunities over the summer.
 
 

RAITH GROUP II TRAINING ANNOUNCEMENT:
The next RAITH GROUP II  will begin training over a number of sessions broken into three groups:

Advanced Hitachi Users, Intensive Short Course, the week of April 28, 2003.
The next main Group II Users beginning the week of May 11, 2003
The second Group II A Users beginning the week of June 17, 2003.

These classes will involve a day of lecture and demo and three days of hands-on training. This will be followed by sessions of smaller breakout groups based on your application in the week to follow.
The goal is to get all qualified advanced Hitachi Ebeam users whom desire access to the RAITH trained and on the system over the summer until we reach capacity on this system.

Please see James Conway during my office hour for more information or to sign up for training.
 

Thank you for your interest in E-beam Lithography and SEM at SNF!


James Conway
650-725-7075