Subject: FINAL - Invitation to Raith / Stanford Advanced Lithography Workshop - February 15, 2012
From: "James W. Conway" <>
Date: Thu, 02 Feb 2012 17:18:19 -0800


Note we have changes some of the times for presenters to speak
This should be the final program version.

Look forward to seeing you there

James Conway


This is the final announcement.  The latest agenda now includes contributions from Dr. Ivan Kravchenko of Oak Ridge National Laboratory, Kelley Rivoire of Stanford University, James Conway of Stanford University, and Ruud Schmits of TNO.  We have already registered ~50% capacity.

Stanford's RAITH150 system has just been upgraded with Raith's unique Fixed Beam Moving Stage (FBMS) capability.  In this context, Raith and the Stanford Nanofabrication Facility cordially invite you to attend the Advanced Nanolithography Workshop.  This one day workshop will be dedicated to advanced patterning techniques that have been implemented by Raith for both electron and ion beam lithography to enhance nanoscale fabrication beyond traditional vector scan patterning. Please use the link below to automatically register for the workshop. As space is limited, we hope that you can confirm as soon as possible.

When: Wednesday February 15, 2012
Where: Allen Building Auditorium (ALLEN 101X), Stanford University
Time: 9:00 AM - 5:00 PM

Click Here to Register
9:00 AM - 9:30 AM Gather, greet and meet over coffee and light snack.
9:30 AM - 9:45 AM Opening remarks
James Conway, Ebeam Technology Group, Stanford Nanofabrication Facility, Stanford University
9:45 AM - 10:45 AM Zero Stitching Error Lithography by Raith Fixed Beam Moving Stage (FBMS) - For Nanophotonics, Plasmonics, and More
Jason E. Sanabia, Ph.D., President & CEO, Raith USA, Inc.
10:45 AM - 11:45 AM Stitch Error Free Nanofabrication for Photonics Research and Development at TNO
Ruud Schmits, Researcher, Nano-instrumentation, TNO
11:45 AM - 12:00 PM Group Photograph
12:00 PM - 1:00 PM Lunch served (soup, sandwiches, salads), Allen X Courtyard Patio
1:00 PM - 1:30 PM Multiply resonant photonic crystal cavities
Kelley Rivoire, Ph.D. Candidate with Prof. Jelena Vuckovic, Electrical Engineering, Stanford University
1:30 PM - 2:15 PM  Large area e-beam lithography on insulator and metal substrates
Ivan Kravchenko, Ph.D., Center for Nanophase Materials Sciences, Oak Ridge National Laboratory
2:15 PM - 3:15 PM Zero Stitching Error Lithography by Raith Modulated Beam Moving Stage (MBMS) - Advanced Periodic Patterning
Jason E. Sanabia, Ph.D., President & CEO, Raith USA, Inc.
3:15 PM - 4:15 PM Ion Beam Lithography with Advanced Patterning Modes, Joseph Klingfus, Ph.D., Applications Scientist and Project Manager for the Stanford RAITH150, Raith USA, Inc.
4:15 PM - 5:00 PM Open discussions


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