Subject: Fwd: Abstracts are due 10 September | SPIE Advanced Lithography
From: "James W. Conway" <>
Date: Mon, 06 Aug 2012 12:02:46 -0700

INSERT TITLE OF WEB PAGE HERE Get your abstracts in before the rush


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Subject: Abstracts are due 10 September | SPIE Advanced Lithography
Date: Mon, 06 Aug 2012 10:02:59 -0600
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Abstracts are
                                      due 10 September | SPIE Advanced

Abstracts due 10 September

Present your research at the world's premier forum for semiconductor lithography.

View Call for Papers (PDF) 
Review conferences

Papers are being accepted in these areas:
 • Advanced Etch Technology for Nanopatterning
 • Extreme Ultraviolet (EUV) Lithography
 • Alternative Lithographic Technologies
 • Metrology, Inspection, and Process Control for Microlithography
 • Advances in Resist Materials and Processing Technology
 • Optical Microlithography
 • Design for Manufacturability through Design-Process Integration

Why authors present their work at
Advanced Lithography:
"I find out the latest news in the industry, reconnect with colleagues, and am usually surprised with new research developments."

"The Lithography community congregates to share experience, promote relationships, and efficiently connect with key players across the entire industry."

"You have a unique opportunity to discuss future possibilities of cutting edge lithography applications with a wide range of experts."

Submit your abstract today





                                      due | SPIE Advanced Lithography.
                                      Click for more information.

Advanced Lithography
24 - 28 February 2013
San Jose Convention Center
and San Jose Marriott
San Jose, California, USA

2013 Symposium Chair
Harry J. Levinson

2013 Symposium Co-Chair
Mircea V. Dusa


SPIE is an international society advancing an interdisciplinary approach to the science and application of light. | +1 360 676 3290
P.O. Box 10, Bellingham, WA 98227-0010, USA

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