---

["multipart/related" not shown] Wed, 31 Oct 2012 17:56:34 -0700

---

Hello Zongfu, Dianmin, and other ZEP520A Users.

I have always used the 1:1 ZEP-520A:anisole dilution for 100 nm target thickness by spinning at 5000 rpm, followed by any bake temp you desire for two minutes.  Formerly at HP Labs I always used 90 degrees C hot plate but here at Stanford we normally use 200 degrees C.  No difference in the dosing when baked at different temperatures.  Thickness are measured on the Nanospec TFA using n = 1.54.

The Gth for straight undiluted ZEP520A is 105 degrees C. and it normally planarizes very well at bakes above the Gth.

Below are spin speed curves for the diluted 1:1 by Volume ZEP520A to Anisole mixture from my data archive.  Please reply to this email when you spin up any of the BACKUP Batch that we just placed into the SNF resist refrigerator to confirm thickness to spin speed for this small volume batch lot. 

Thank you,

James
 

Comment:	ZEP520:Anisole=1:1   n=1.54 in nanospec

James, Thanks!! 

One question, I used straight ZEP520A before at 8000 rpm and 40s. Now I want to try the 1:1 for even thinner coating, do you have some document that describes the speed vs coating thickness? Thanks,

Zongfu

On Wed, Oct 31, 2012 at 5:19 PM, James W. Conway <jwc@snf.stanford.edu> wrote:

Mixed 1:1 and straight ZEP520A and its in the refrigerator.

Refer to this message to raith@snf.stanford.edu http://snf.stanford.edu/cgi-bin/ezmlm-cgi?2160:mss:4903:201211:ilolakpicolgebmocadj

All the Best

James

On 10/31/2012 3:34 PM, Waqas Mustafeez wrote:

James, was Rich able to give us some zep?
I have time on raith tomorrow but cant proceed without it.

WM
-------------------
Waqas Mustafeez, PhD
Electrical Engineering, Material Science
Stanford University

Wed, 31 Oct 2012 17:56:34 -0700

---

["image/gif" not shown] Wed, 31 Oct 2012 17:56:34 -0700

---