Subject: Seminar: Resists for nanoimprint lithography and SU-8 by Microresist Technology GmbH.
From: James Conway <jwc@snf.stanford.edu>
Date: Tue, 24 Feb 2004 09:43:21 -0800
Tue, 24 Feb 2004 09:43:21 -0800
Greetings,

Thought you all might be interested in this presentation.

JWC


-------- Original Message --------
Subject: 	Seminar: Resists for nanoimprint lithography and SU-8
Date: 	Mon, 23 Feb 2004 23:47:47 -0800
From: 	Beth Pruitt <pruitt@stanford.edu>
To: 	labmembers@snf.stanford.edu,kennygroup@micromachine.stanford.edu, 
pruittlab@lists.stanford.edu,santiagogroup@microfluidics.stanford.edu, 
microheat@lists.Stanford.EDU,Olav Solgaard <solgaard@stanford.edu>, 
Mahnaz Mansourpour <mahnaz@snf.stanford.edu>, Nick Melosh 
<nmelosh@stanford.edu>,Curt Frank <curt.frank@stanford.edu>, Stacey Bent 
<sbent@stanford.edu>



SPECIAL SEMINAR on Ultrathick and Ultrathin resists
TUESDAY Feb 24
4pm in CISX Auditorium

Photoresists for nanoimprint lithography and Processing of thick SU-8

visitor Dr. Freimut Reuther of micro resist technology (mrt) GmbH will 
discuss the following:

Overview on polymers for nanoimprint lithography (NIL) of 
(characteristics, behaviour, basic processing considerations)
Overview on high thickness positive tone photoresists
Purpose and benefits of IR baking of high thickness photoresists and 
baking examples including positive photoresists and SU-8

SNF recently obtained EV nanimprint lithography equipment and several 
labmembers have been using SU-8 for mixed applications with varying 
results. If you have questions or are thinking of using these materials, 
please attend this seminar and discuss with our visitor from mrt in Berlin.


Greetings,

Thought you all might be interested in this presentation.

JWC


-------- Original Message --------
Subject: Seminar: Resists for nanoimprint lithography and SU-8
Date: Mon, 23 Feb 2004 23:47:47 -0800
From: Beth Pruitt <pruitt@stanford.edu>
To: labmembers@snf.stanford.edu,kennygroup@micromachine.stanford.edu, pruittlab@lists.stanford.edu,santiagogroup@microfluidics.stanford.edu, microheat@lists.Stanford.EDU,Olav Solgaard <solgaard@stanford.edu>, Mahnaz Mansourpour <mahnaz@snf.stanford.edu>, Nick Melosh <nmelosh@stanford.edu>,Curt Frank <curt.frank@stanford.edu>, Stacey Bent <sbent@stanford.edu>


SPECIAL SEMINAR on Ultrathick and Ultrathin resists
TUESDAY Feb 24
4pm in CISX Auditorium

Photoresists for nanoimprint lithography and Processing of thick SU-8

visitor Dr. Freimut Reuther of micro resist technology (mrt) GmbH will discuss the following:

Overview on polymers for nanoimprint lithography (NIL) of (characteristics, behaviour, basic processing considerations)
Overview on high thickness positive tone photoresists
Purpose and benefits of IR baking of high thickness photoresists
and baking examples including positive photoresists and SU-8

SNF recently obtained EV nanimprint lithography equipment and several labmembers have been using SU-8 for mixed applications with varying results. If you have questions or are thinking of using these materials, please attend this seminar and discuss with our visitor from mrt in Berlin.