Subject: Beamtools report for Friday May 9, 2003 : Noon
From: James Conway <jwc@snf.stanford.edu>
Date: Fri, 09 May 2003 13:37:03 -0700

Greetings:

All Ebeam and SEM systems are up and available for users:

Semhitachi, S-800 FE-SEM is up.
Please use the new SOP procedure, a copy is in the SEM LAB.

Ebeam, H-700 Ebeam Exposure System is up and available to users.
- The schedule is nearly full, see Paul Jerabek or James Conway if you are having problems making a reservation on CORAL.
- New users are encouraged to attend the Open Labs for New Users on Thursdays 1 - 3 PM to get assistance running your first writes, or team up with an experienced user.
- SEM Review of Process Control Monitor patterns written after the system came back up resolved lines on gratings to 110  nm on 300 nm pitch.  (Std. PMMA Process, 550 uC/cm-2 dose. d=300 nm) Images posted on Bulletin board.
-Please report the number of wafers you have written for last two weeks and the minimum feature size you achieved.

S-4160 is up and ready for your use.

RAITH 150 is up and available for users.
The system schedule is nearly full, see James Conway if you are having problems making a reservation on CORAL.
Please report the number of wafers you have written for last two weeks and the minimum feature size resolved.
 

Thank you for your interest in E-beam Lithography and SEM at SNF!

James Conway || Paul Jerabek || Charley Williams III
E-beam Technology Group, Stanford Nanofabrication Facility
650-725-7075