Subject: RAITH UPDATE Jan. 27, 2003 11:31 AM
From: James Conway <jwc@snf.stanford.edu>
Date: Mon, 27 Jan 2003 11:40:45 -0800


Greetings and Good Morning,

This last Friday afternoon it looked hopeful that we would be resolving
the Write Field to adjacent Write field stitching error we had been
experiencing recently on the RAITH 150.  Inspections of patterns written
overnight Thursday to Friday passed all inspection criteria for lateral
U and V dimension offsets.

E-beam Lithography write tests performed over the weekend to repeat this
result on a larger number of patterns and chip writes resulted in no
acceptable stitching alignment between write fields at any write, and
pattern placement globally was in error on one 2 X 5 array as well.
(Overlapped pattern placement)

The system will continue to be down for troubleshooting and repair
through this week.  We will report to these list when the system comes
back up for use.

Raith USA personnel from Islip, N.Y. and RAITH GmbH specialist from
Dortmund, Germany will arrive this afternoon to continue troubleshooting
and repairs to this system.

Thank you for your patience and support during this period.

James Conway
650-725-7075