Subject: Comment raith 2004-03-08 11:46:36: Users will need more help than normal.
From: jwc@snf.stanford.edu
Date: Mon, 8 Mar 2004 11:46:37 -0800

If can be very diffficult to focus and stigmate on a feature because it takes much less
mouse translation to go through the ranger of focus and stigmation.
Please be sure to process your write field alignment properly and carefully being sure
to verify that the shift and rotation values are nominally below one micron U-V.
No problems with image acquisition and the ELPHY plus pattern generator are seen in
either the qualification run or on the system this morning.
Thank you,
JWC