Subject: Comment raith SNF 2006-01-24 18:26:53: SYSTEM REQUALIFIED -- NO PROBLEMS FOUND
From: jwc@snf.stanford.edu
Date: Tue, 24 Jan 2006 18:26:53 -0800

GREETINGS:
IN REFERENCE TO STITCHING ISSUES REPORTED LAST WEEK, WE HAVE DETERMINED THAT THESE RESULTS
WERE SIMPLY THE RESULT OF NEW USERS WRITE FIELD ALIGNMENT RESULTS AND NOT ANY PROBLEMS
WITH THE RAITH SYSTEM.
USERS ARE ENCOURAGED TO ALWAYS CAREFULLY INSPECT THEIR PATTERNS UNDER THE OPTICAL MICROSCOPE
AND IF NECESSARY THE SEM BEFORE CONTINUING WITH PATTERN TRANSFER.
THE RAITH SYSTEM WAS FULLY REQUALIFIED THIS AFTERNOON AND NO PROBLEMS WERE OBSERVED.

REF: PCM TEST 01242006 ON WAFER 02072005_2 / LOT 10312005 2% 950 K PMMA 108 nm thickness.
JAMES CONWAY