Subject: Comment raith SNF 2006-09-13 17:34:21: excellent stitching and resolution on qualification test 9112006
From: jwc@snf.stanford.edu
Date: Wed, 13 Sep 2006 17:34:21 -0700

greetings:
We achieved excellent stitching and resolution on qualification test EXPOSURE 9112006
AFTER the system was brought up.
Stitching offset WF to WF is better than the measurement gage of the LEO SEM at < 5nm.
 Single Pixel lines display supurb line edge roughness once dose to clear the film is
reached.
James Conway