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Subject: Metal and Dielectric Etch Discussion
From: Ed Myers <edmyers@stanford.edu>
Date: Mon, 26 Nov 2012 09:48:41 -0800 
All,

I would like to meet at 10am on Monday, Dec. 3rd in 101 Allen to discuss 
the PlasmaTherm metal and dielectric etch systems.  As many of you know 
the PlasmaTherm DRIE system has completed it's acceptance.  This means, 
it is now available for process characterization.  I would like to meet 
with the etch community to discuss the process needs for the PlasmaTherm 
systems.

Please come to discuss your process needs and what needs to happen on 
the PlasmaTherm systems.  If you know anyone who needs etches that have 
not been supported in the past, please make sure they are invited.

Regards,
Ed
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