Thank you for those who attended. For those who did not, please review
the attached meeting minutes.
On 11/26/2012 9:48 AM, Ed Myers wrote:
> I would like to meet at 10am on Monday, Dec. 3rd in 101 Allen to
> discuss the PlasmaTherm metal and dielectric etch systems. As many of
> you know the PlasmaTherm DRIE system has completed it's acceptance.
> This means, it is now available for process characterization. I would
> like to meet with the etch community to discuss the process needs for
> the PlasmaTherm systems.
> Please come to discuss your process needs and what needs to happen on
> the PlasmaTherm systems. If you know anyone who needs etches that
> have not been supported in the past, please make sure they are invited.
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