Subject: Re: Metal and Dielectric Etch Discussion
From: Ed Myers <edmyers@stanford.edu>
Date: Tue, 04 Dec 2012 10:04:20 -0800
Tue, 04 Dec 2012 10:04:20 -0800
All,

Thank you for those who attended.  For those who did not, please review 
the attached meeting minutes.

Regards,
Ed

On 11/26/2012 9:48 AM, Ed Myers wrote:
> All,
>
> I would like to meet at 10am on Monday, Dec. 3rd in 101 Allen to 
> discuss the PlasmaTherm metal and dielectric etch systems.  As many of 
> you know the PlasmaTherm DRIE system has completed it's acceptance.  
> This means, it is now available for process characterization.  I would 
> like to meet with the etch community to discuss the process needs for 
> the PlasmaTherm systems.
>
> Please come to discuss your process needs and what needs to happen on 
> the PlasmaTherm systems.  If you know anyone who needs etches that 
> have not been supported in the past, please make sure they are invited.
>
> Regards,
> Ed
>



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