Problem AG4100 SNF 2010-05-14 15:35:41: Failed Qualification

emyers at snf.stanford.edu emyers at snf.stanford.edu
Fri May 14 15:35:42 PDT 2010


System failed for overtemperature during the fourth wafer.  System water flow is 0.5-0.6 gpm against a specification of 2.0 gpm.  The qualification oxide thickness for the three wafers which did run were within specification (132 Ang.) and within 2 angstroms of the Feb. Qual.




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