Problem AG4108 2003-09-25 22:31:36: Particles during N2 anneal

rwoo at rwoo at
Thu Sep 25 10:31:40 PDT 2003

Particles also deposited on wafer during N2 1000 deg anneal.  Also, chamber temperature did not reach 1000 deg and program aborted.  Wafer and temp. graph on top of AG4108 manual binder.

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