Comment AG4108 SNF 2007-05-22 00:26:14: oxidation test results

skoh at snf.stanford.edu skoh at snf.stanford.edu
Tue May 22 00:26:15 PDT 2007


RTO 1150C 30s. Expected thickness 120A
After running several wafers at 1150C, ran 3 wafers sequentially:
1st wafer: avg 96.9 std dev 3.9
2nd wafer: avg 105 std dev 3.6
3rd wafer: avg 107 std dev 4.1




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