Comment AG4108 SNF 2007-05-22 00:26:14: oxidation test results

[skoh at snf.stanford.edu]

RTO 1150C 30s. Expected thickness 120A
After running several wafers at 1150C, ran 3 wafers sequentially:
1st wafer: avg 96.9 std dev 3.9
2nd wafer: avg 105 std dev 3.6
3rd wafer: avg 107 std dev 4.1