From bgreene at stanford.edu Tue Jan 9 18:42:47 2001 From: bgreene at stanford.edu (Brian Joseph Greene) Date: Tue, 9 Jan 2001 18:42:47 -0800 (PST) Subject: AG4108 Usage Poll - Response Requested Message-ID: AG4108 Users, I am polling the current users of the AG4108 to determine the general usage of the machine. This is primarily to determine which set of quartzware (oxidation or silicide) should be the default setup for the AG4108. Please respond to me, and let me know if the majority of your future work will require the use of clean quartzware, silicide quartzware, or if the cleanliness of the quartzware is not important. I'll compile the results, and send them out by the end of the week. Also, I need to use the clean quartzware for a set of anneals. If anyone has definite plans to use the AG4108 with the silicide quartzware in the next few weeks, let me know so we can coordinate the swapping of the quartzware. The AG4108 is currently set up with the silicide quartzware. Thanks, Brian _____________________________________________________________ Brian J. Greene Office: CIS-X 128X Applied Physics Dept, MC 4090 Phone: (650) 723-4194 ext 5 Stanford University Pager: (650) 354-9687 Stanford, CA 94305-4090 Fax: (650) 723-4659 From bgreene at stanford.edu Mon Jan 22 15:43:36 2001 From: bgreene at stanford.edu (Brian Joseph Greene) Date: Mon, 22 Jan 2001 15:43:36 -0800 (PST) Subject: Changing quartzware Message-ID: Users, I am planning to ask Len to change the AG4108 quartzware to the wbdiff clean quartzware THIS WEDNESDAY. I sent out an email a couple of weeks ago warning users of this request. The clean quartzware will remain installed for approximately one week. Please let me know this causes any problems for any of you. Thank you, Brian _____________________________________________________________ Brian J. Greene Office: CIS-X 128X Applied Physics Dept, MC 4090 Phone: (650) 723-4194 ext 5 Stanford University Pager: (650) 354-9687 Stanford, CA 94305-4090 Fax: (650) 723-4659 From king at snf.stanford.edu Mon Jan 22 19:22:42 2001 From: king at snf.stanford.edu (Robin King) Date: Mon, 22 Jan 2001 19:22:42 -0800 (PST) Subject: Changing quartzware In-Reply-To: Message-ID: On a related note, there may be a change in policy regarding separate diffusion and silicide trays. If you have any comments please contact Jim McVittie or Krishna Saraswat so they have your input. I believe they're trying to simplify the quartzware procedures while maintaining diffusion-clean standards. They may be considering a change in allowed materials as well. Robin King On Mon, 22 Jan 2001, Brian Joseph Greene wrote: > Users, > I am planning to ask Len to change the AG4108 quartzware to the wbdiff > clean quartzware THIS WEDNESDAY. I sent out an email a couple of weeks > ago warning users of this request. The clean quartzware will remain > installed for approximately one week. Please let me know this causes any > problems for any of you. > > Thank you, > Brian > > _____________________________________________________________ > Brian J. Greene Office: CIS-X 128X > Applied Physics Dept, MC 4090 Phone: (650) 723-4194 ext 5 > Stanford University Pager: (650) 354-9687 > Stanford, CA 94305-4090 Fax: (650) 723-4659 > > From ibrahim at Stanford.EDU Mon Jan 22 19:31:17 2001 From: ibrahim at Stanford.EDU (Nabeel Robert Ibrahim) Date: Mon, 22 Jan 2001 19:31:17 -0800 (PST) Subject: Changing quartzware In-Reply-To: from "Robin King" at Jan 22, 2001 07:22:42 PM Message-ID: <200101230331.f0N3VHj10808@saga22.Stanford.EDU> >On a related note, there may be a change in policy regarding separate >diffusion and silicide trays. If you have any comments please contact >Jim McVittie or Krishna Saraswat so they have your input. I believe >they're trying to simplify the quartzware procedures while maintaining >diffusion-clean standards. They may be considering a change in allowed >materials as well. That is true. Pinkesh and I did some work a couple of years ago which showed no cross-contamination between silicided and oxidized wafers. I would like to have a user's group meeting to discuss this issue, hopefully later this week or early next week. Once I schedule the room, I'll let everyone know. Nabeel -------------------------------------------------------------- >On Mon, 22 Jan 2001, Brian Joseph Greene wrote: > >> Users, >> I am planning to ask Len to change the AG4108 quartzware to the wbdiff >> clean quartzware THIS WEDNESDAY. I sent out an email a couple of weeks >> ago warning users of this request. The clean quartzware will remain >> installed for approximately one week. Please let me know this causes any >> problems for any of you. >> >> Thank you, >> Brian >> >> _____________________________________________________________ >> Brian J. Greene Office: CIS-X 128X >> Applied Physics Dept, MC 4090 Phone: (650) 723-4194 ext 5 >> Stanford University Pager: (650) 354-9687 >> Stanford, CA 94305-4090 Fax: (650) 723-4659 >> >> > > From takamura at stanford.edu Tue Jan 23 11:58:02 2001 From: takamura at stanford.edu (Yayoi Takamura) Date: Tue, 23 Jan 2001 11:58:02 -0800 (PST) Subject: chart recorder In-Reply-To: Message-ID: AG4108 Users, Just a friendly reminder to turn off the chart recorder when it is not needed. The chart recorder paper ran out today and it appears to be partly due to it being left on. Thanks, Yayoi **************************************************************** Yayoi Takamura CISX Building, Room 300 Stanford University Stanford, CA 94305 (650) 725-0418 takamura at leland.stanford.edu www.stanford.edu/~takamura/ **************************************************************** From ibrahim at Stanford.EDU Tue Jan 23 15:11:39 2001 From: ibrahim at Stanford.EDU (Nabeel Robert Ibrahim) Date: Tue, 23 Jan 2001 15:11:39 -0800 (PST) Subject: [AG4108] Users meeting Message-ID: <200101232311.f0NNBeg25760@saga22.Stanford.EDU> To all AG4108 users, There has been some discussion recently about changing procedures in the AG4108 so that the same quartzware can be used for all processing. We will be having a meeting on Thursday at noon in CISX room 338 to discuss this and determine what testing procedures we need to perform to verify the cleanliness of the system. All 4108 users are invited and encouraged to attend. Nabeel From ibrahim at Stanford.EDU Thu Jan 25 00:59:46 2001 From: ibrahim at Stanford.EDU (Nabeel Robert Ibrahim) Date: Thu, 25 Jan 2001 00:59:46 -0800 (PST) Subject: [AG4108] Users meeting In-Reply-To: from "ibrahim" at Jan 23, 2001 03:11:40 PM Message-ID: <200101250859.f0P8xkJ07459@saga21.Stanford.EDU> Just a reminder about the meeting today... >To all AG4108 users, > >There has been some discussion recently about changing procedures in the >AG4108 so that the same quartzware can be used for all processing. We will >be having a meeting on Thursday at noon in CISX room 338 to discuss this and >determine what testing procedures we need to perform to verify the >cleanliness of the system. All 4108 users are invited and encouraged to >attend. > >Nabeel From booth at snf.stanford.edu Thu Jan 25 14:21:40 2001 From: booth at snf.stanford.edu (Len Booth) Date: Thu, 25 Jan 2001 14:21:40 -0800 Subject: Wafer tray changed to oxidation. Message-ID: <3A70A6F4.3E78826C@snf.stanford.edu> Users - There was a meeting today at lunch for all interested users of the AG4108. Nabeel will be sending out a synopsis of the issues discussed. In the meantime, as agreed at the meeting, I have changed the quartz tray from silicide to oxidation. I have not changed the quartz chamber/tube. Therefore the machine is available for clean oxidation uses - but not for silicide types of annealing. For more info - see Nabeel's writeup (should be written soon). Len From ibrahim at Stanford.EDU Fri Jan 26 10:35:59 2001 From: ibrahim at Stanford.EDU (Nabeel Robert Ibrahim) Date: Fri, 26 Jan 2001 10:35:59 -0800 (PST) Subject: AG4108 Users meeting summary Message-ID: <200101261835.f0QIZxm13962@saga13.Stanford.EDU> These are the major points that were discussed at the AG4108 User's Meeting yesterday. 1) Having the 2nd AG RTA up and running would solve most of our problems because we could use it as a metal contaminated system, however it will take several months to set it up. Dick Crane should be notified of the importance of the machine so that a timetable can be created for setting it up. 2) Because the chamber in the 4108 system has cold walls, the emission of materials that had been deposited on the system walls was not determined to be of great concern. Concerns about cross contamination between silicided wafers and diffusion clean wafers were limited to the following possibilities: - Does the presence of Cl and S (from our cleaning process) result in volatile products (such as TiCl4)? - Does material from the backside of a wafer get deposited on the support pins and, if so, can it be transferred to subsequent wafers? 3) I will do some experiments to determine whether any cross contamination can be detected by electrical measurements. I will coordinate with Len to ensure that we have a clean chamber and will run wafers for oxidation, then for silicidation, then for oxidation again. The oxidized wafers will be used to build capacitor structures and I will have the pre and post silicidation capacitor structures tested for CV shifts and current through the oxide. 4) After running the experiments, I will write up a procedure for testing the system for cross contamination. The cross contamination tests should be run every 6 months. 5) If a user wants to put new materials into the system, s/he will be responsible for running the cross contamination experiments. 6) We have several possibilities for processing procedures: - STATUS QUO: Maintain separate quartz chambers and trays for clean and silicide processing. Change them as necessary. - SAME CHAMBER, DIFFERENT TRAY: Use the same chamber for clean and silicide processing, but change the tray which holds the wafer. This eliminates the possibility of cross contamination via the tray pins. Mike P. and Len said that changing the tray should take about 15 minutes and therefore is not a great burden on lab staff or users. - SAME CHAMBER, SAME TRAY: Use all of the same quartzware for clean and silicide processing. Cross contamination possibilities need to be examined more before the procedure can be fully evaluated. Tentatively, we will use the SAME CHAMBER, DIFFERENT TRAY procedure until all testing is done. This allows for flexibility of the machine, minimizes the chance of damaged quartware and eliminates most cross contamination possibilities. If there are any questions or corrections, please email me. Nabeel