Problem amtetcher 2001-09-13 12:13:30: high pr etch rate using program 27

beckwith at snf.stanford.edu beckwith at snf.stanford.edu
Thu Sep 13 12:13:55 PDT 2001


Could someone check the calibrations for O2, CHF3, and 
chamber pressure?
Prior to all of the equipment problems we were getting a 
consistant etch rate of 385A/min. Now we are getting from 
450-500A/min. The etch rate also  varies from one etch to the
next. We need a consistant, lower etch rate for our process.
Thanks.




More information about the amtetcher-pcs mailing list