Comment amtetcher SNF 2008-11-19 11:45:02: Low Etch Rate (oxide) Process 3

jsuarez at snf.stanford.edu jsuarez at snf.stanford.edu
Wed Nov 19 11:45:02 PST 2008

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Oxide Etch Rate = 296A/min
 RF during process = 1110/1180 W

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